AO-2DSL-FCNET
Low-Oxygen Oven
- Chamber dimensions
- W1000 × D500 × H610 × 2 mm
- Temperature range
- RT (Ambient) +60 to +300°C
Semiconductor Process Ovens
COL-2600-HMI
Clean Oven
Clean Oven documented on the official DONE-E product page. Performance and configuration vary by model; the values below are included only when present in that source.
Key performance
Published values at a glance.
Values are shown only when they were extractable from this model's official DONE-E page.
- Chamber dimensions
- W1 8 00×H1 8 00×D 80 0
- Exterior dimensions
- W 243 0×H2 585 ×D 1285
- Temperature range
- Ambient +10 to 20 0°C
- Temperature uniformity
- ±1.5%(empty chamber)
Product overview
Source-led, model-specific information.
Clean Oven documented on the official DONE-E product page. Performance and configuration vary by model; the values below are included only when present in that source.
Data status
Verified specifications translated from the official product page
Source verification
Official DONE-E source URLs are retained in the internal product data for factual audit.
Applications
Exact English application wording is to be confirmed. This product is currently organized under Semiconductor Process Ovens; engineering review is required before matching it to a process.
Technical specifications
Published model data.
No value is borrowed from another product. Fields missing from the official page remain unpublished here.
| Chamber dimensions | W1 8 00×H1 8 00×D 80 0 |
|---|---|
| Exterior dimensions | W 243 0×H2 585 ×D 1285 |
| Temperature range | Ambient +10 to 20 0°C |
| Temperature uniformity | ±1.5%(empty chamber) |
| Rated power | 30 KW |
| Cleanliness | Class 100 |
Translation and unit presentation are provided for navigation. The cited official source remains the audit reference.
Features, control & automation
Only capabilities detected on this product page.
- SUS304 stainless-steel construction or components, within the scope stated by the source
- PLC-based control
- Touchscreen interface
- Historical data query or recording
- USB data export is stated
- Nitrogen atmosphere capability
- Over-temperature protection
Downloads
Technical documents.
English datasheet
Coming soon — no PDF fabricated
Application guide
Coming soon — no PDF fabricated
Related products
More in Semiconductor Process Ovens.
AOL-100-PC
PI / BPO / BCB Curing Oven
- Temperature range
- Ambient+20°C to 500°C
- Cleanliness
- Class 100
AOL-100GV-HMI
Wafer Baking Oven
- Chamber dimensions
- W 61 0×H 65 0×D 75 0
- Exterior dimensions
- W1900 × H2075 × D1250
Engineering review